Ellipsometry is a powerful nondestructive technique for the investigation of the dielectric properties of thin films. It has applications in many industrial settings including semiconductor physics, microelectronics, displays, and solar panels.
In ellipsometry, the polarization change of a light beam is measured when it is reflected by the sample. This change in polarization can be used to measure material properties such as film thickness and optical constants.
ELLIPSOMETRIC PARAMETERS (Δ and Ψ)
ONE EXAMPLE OF COMMON ELLIPSOMETRY SETUPS USING A PEM
Material and surface characterization; surface science; material science; semiconductor industry
ADDITIONAL TOOLSEllipsometry Complete Solution Packages
S. N. Jasperson and S. E. Schnatterly, “An Improved Method for High Reflectivity Ellipsometry Based on a New Polarization Modulation Technique,” Rev. Sci. Instrum. 40, 761-767 (1969); Errata 41, 152 (1970).
Contact us for more information on ellipsometry and photoelastic modulators.